从最合适的方向合成金属薄膜.docx

上传人:b****8 文档编号:12813334 上传时间:2023-06-08 格式:DOCX 页数:37 大小:463.78KB
下载 相关 举报
从最合适的方向合成金属薄膜.docx_第1页
第1页 / 共37页
从最合适的方向合成金属薄膜.docx_第2页
第2页 / 共37页
从最合适的方向合成金属薄膜.docx_第3页
第3页 / 共37页
从最合适的方向合成金属薄膜.docx_第4页
第4页 / 共37页
从最合适的方向合成金属薄膜.docx_第5页
第5页 / 共37页
从最合适的方向合成金属薄膜.docx_第6页
第6页 / 共37页
从最合适的方向合成金属薄膜.docx_第7页
第7页 / 共37页
从最合适的方向合成金属薄膜.docx_第8页
第8页 / 共37页
从最合适的方向合成金属薄膜.docx_第9页
第9页 / 共37页
从最合适的方向合成金属薄膜.docx_第10页
第10页 / 共37页
从最合适的方向合成金属薄膜.docx_第11页
第11页 / 共37页
从最合适的方向合成金属薄膜.docx_第12页
第12页 / 共37页
从最合适的方向合成金属薄膜.docx_第13页
第13页 / 共37页
从最合适的方向合成金属薄膜.docx_第14页
第14页 / 共37页
从最合适的方向合成金属薄膜.docx_第15页
第15页 / 共37页
从最合适的方向合成金属薄膜.docx_第16页
第16页 / 共37页
从最合适的方向合成金属薄膜.docx_第17页
第17页 / 共37页
从最合适的方向合成金属薄膜.docx_第18页
第18页 / 共37页
从最合适的方向合成金属薄膜.docx_第19页
第19页 / 共37页
从最合适的方向合成金属薄膜.docx_第20页
第20页 / 共37页
亲,该文档总共37页,到这儿已超出免费预览范围,如果喜欢就下载吧!
下载资源
资源描述

从最合适的方向合成金属薄膜.docx

《从最合适的方向合成金属薄膜.docx》由会员分享,可在线阅读,更多相关《从最合适的方向合成金属薄膜.docx(37页珍藏版)》请在冰点文库上搜索。

从最合适的方向合成金属薄膜.docx

从最合适的方向合成金属薄膜

SynthesisofFerroelectricThinFilmswithPreferredOrientation

INTRODUCTION

Thinfilmprocessingisquiteimportantforthedevelopmentofdeviceminiaturization,hybridizationandlowerworkingvoltage.Severalpropertiesoffunctionalmaterialsarerequiredforapplicationsatasub-micronlevelorlessthanthat.Thinfilmprocessingtechniquesalsohavebeenreceivinggreatattentionforapplicationsinsemiconductormemories,opto-electronicdevices,electroniccomponents,displaydevices,magneticdevices,sensorsandemergingarea.Thelowtemperaturethinfilmprocessingalsorequirestheprecisecontrolofchemicalcomposition,thedesireddirectionofcrystalgrowth,andthehighcrystallinity.Inthisarea,epitaxialsingle-crystalthinfilmswithepitaxyareusuallyexpected.Amongseveralfunctionalmaterialthinfilms,ferroelectricthinfilmswithpreferredorientationhavebeenmainlystudiedtoimproveferroelectricpropertiesandsatisfytherequirementsfordeviceapplicationsuptonow.Inaddition,highlyorientedelectro-conductiveincludingsuperconductivethinfilmshavealsobeeninvestigatedtoachievehighelectricalconductivityandtouseasabufferlayerofdielectricthinfilmswithpreferredorientation.Inotherexamples,thereareseveralmagneticandopticalmaterialsthinfilmswithpreferredorientation,etc.Recently,withtheprogressofthinfilmtechnology,intensiveeffortshavebeenfocusedonthepreparationofepitaxialthinfilmsmainlyonsinglecrystalsubstratesformakingclearthepropertiesofthinfilmswithseveralfunctionalities.

Varioustechniquesavailabletodayforthefabricationofthinfilmsarenoticeablymorevariedintypeandinsophisticationthancouplesofdecadesago.Betterequipmentandmoreadvancedtechniqueshas,undoubtedly,ledtohigherqualityfilms,andindeed,maybeaprimaryfactorinthenowroutineachievementofdesiredfunctionalitiesinthinfilms(50nmorgreater)preparedbyaselectionofdifferentmethods(Lee,1971).

Thechemicalsolutiondeposition(CSD),includingsol–gel,processisoneofthemostcommonprocessesasthemethodofthinfilmfabrication.Thisprocesscanbewidelyappliedforoptical,electrical,magnetical,mechanical,catalysis,etc.Themostimportantadvantagesofchemicalsolutionprocessarehighpurity,goodhomogeneity,lowerprocessingtemperature,precisecompositioncontrolforthepreparationofmulticomponentcompounds,versatileshapingandpreparingbysimpleandcheapapparatuscomparedwithothermethod.However,thelargerthenumberofelements,themorecomplicatedthesolutionchemistry,leadingtodifficultiesinachievingthedesiredcrystallinephases.Therefore,itisrequiredtodesignthemetal-alkoxideprecursorsthroughcontrollingthemetal–oxygen–carbonbondsincomponentsubstancesandtoinvestigatethesolutionofmulticomponentsystemindetail.Also,thecrystallizationbehavioriscomplicated,sotheinvestigationofcrystallizationprocessisakeyforfilmsynthesis.Thefilmsthatareusuallyproducedbychemicalsolutionprocessareofpolycrystallinenature,however,inmanyinstancesitisdesirabletoproduceepitaxialfilmgrowth.Theas-depositedgelfilmsontheproperlyselectedsubstratesundergotheatomicrearrangementduringcalcinationandcrystallizationyieldingepitaxialfilms.

Inthischapter,therefore,wedealswithvariousprocessingfactorsforpreparingthinfilmswithpreferredorientation,suchas(l)thecontrolofthestructureofmetal-organicprecursorswithconsideringthestoichiometryinsolutionforcoating,

(2)theselectionofthesubstratesforthinfilmfabrication,(3)theintermediatebufferlayers(includingaelectrodelayer)betweenthefilmandthesubstrate,(4)theheating(calcinationandcrystallization)conditionsforLiNbO3(LN),K(Ta,Nb)O3(KTN)andtungstenbronze(Sr,Ba)Nb2O6(SBN),whichareferroelectricsubstancesascasestudies.EpitaxialLN,KTNandtungstenbronzeSBN-basedthinfilmsaresuccessfullysynthesizedonsapphireC,MgO(100)andPt(100)/MgO(100),etc.substrates.

CASESTUDY1:

PREPARATIONOFHIGHLYORIENTEDLiNbO3THINFILMS

LiNbO3FilmswithPreferredOrientation

Lithiumniobate(LiNbO3)hasaillumenitestructure,andhasvariousattractiveproperties,suchasacoustic,piezoelectric,pyroelectric,acoustoopticandelectroopticproperties.LiNbO3singlecrystalshavegenerallybeengrownmainlybytheCzochralskimethod.However,aLiNbO3singlecrystalhasbeengrownfromanonstoichometricmeltofharmoniccomposition(Li2O/Nb2O5=48/52)bytheCzochralskimethod.Recently,thedevelopmentofachemicalsolutionprocessingrouteforepitaxialstoichiometricLiNbO3thinfilmswithhighqualityonappropriatesubstrateshasbeenreceivinggreatattentions,andstronglyrequiredforminiaturizingandintegratingelectricalandopticalthinfilmdevices(Weis,1985;Hirano,1988a,1988b,1988c,1989,1991,1992a,1993;Nashimoto,1995).ThestoichiometricLiNbO3filmscrystallizedonSisubstratesareusuallypolycrystalline,whilethefilmsonsapphiresubstratesarefoundtoshowpreferredorientationsdependinguponcrystallographicplanesofsapphire.Onlythe110,012and006reflectionsofLiNbO3wereobservedonsapphireR,AandCsubstrates,respectively(Hirano,1989,1991,1992a;Nashimoto,1996).Also,themicro-patterningoforientedLiNbO3filmbythemodificationofligandsoftheLiNbO3precursorcombinedwithUVirradiationhavebeendemonstrated(Yogo,1995a).

Thissectionfocusesontheorientationcontrolofalkoxy-derivedLiNbO3thinfilmsbycontrollingthestructure(doingthemoleculardesign)ofmetal-organicprecursorsinsolution.TheeffectofmodificationofLi[Nb(OEt)6]doublealkoxideisinvestigatedforthesynthesisofepitaxialLiNbO3thinfilms.LiNbO3filmsofexcellentpreferredorientationaresuccessfullysynthesizedonsubstratesfromthemodifiedLiNbO3precursors.

EffectsofModificationofLigandsofPrecursorsonthePreparationofEpitaxiallyGrownLiNbO3Films

PBD-ModifiedLiNbO3Precursor.Non-modifiedLiNbO3(STD-LiNbO3)precursorsolutionsarepreparedfromLiOEtandNb(OEt)5inethanol(Hirano,2002).ThestructureoftheprecursorwasconfirmedtoconsistofacomplexalkoxideLi[Nb(OEt)6],whichwasreportedbyEichorstetal.(1990)indetail(Eichorstetal.,1990).Ontheotherhand,threetypesofβ-diketonecompoundsareselectedbaseduponthenumberofbenzenerings(phenylgroups)initsstructure.Inthiscase,thecoordinationofl-phenyl-1,3-butanedione(PBD)totheLiNbO3precursorisconfirmedbyUVspectra.Thesimilarcoordinationisalsorealizedin2,4-pentanedione(PD)-and1,3-diphenyl-1,3-propanedione(DPPD)-modifiedLiNbO3precursors,whichwasconfirmedbyUV-spectra.Theproposedstructuresoftheseβ-diketonemodifiedLiNbO3precursorsareshowninFigure17-1.

SapphireCsubstratesareselectedinordertofabricatehighlyorientedLiNbO3thinfilms,becausethec-planeofLiNbO3hasthegoodcrystallographicmatchingwithcplaneofα-Al2O3.Figure17-2showstheXRDprofileoftheLiNbO3thinfilmfromthePBD-modifiedprecursoronasapphireCsubstratecrystallizedat550°C.Thisfilmshowsaremarkablec-axispreferredorientation.The006reflectionofLiNbO3appearsataslowas400°C,andincreasesinintensitywithincreasingheattreatmenttemperature.However,theXRDevaluationisnotproperforthejudgementofthedegreeofpreciseorientations.Therefore,furtherinvestigationisrequiredtoexaminethecrystallographicrelationbetweenfilmsandsubstratesasmentionedbelow.

Figure17-1.SupposedstructuresoftheSTD-LiNbO3andtheβ-diketonemodifiedLiNbO3(1equivof2,4-pentanedion(PD),1-phenyl-1,3-butanedion(PBD)and1,3-diphenyl-1,3-propanedion(DPPD))precursors.

Figure17-2.XRDprofileoftheLiNbO3thinfilmpreparedonasapphireCsubstratesfromthe1equiv.PBDmodifiedLiNbO3precursorsolutionat550°C.

Figure17-3.(a)X-raypolefiguresoftheLiNbO3thinfilmspreparedonsapphireCsubstratesfromSTD-LiNbO3,(b)1equiv.PBDmodified-LiNbO3precursorsolutionsandheat-treatedat550°C[2θ=23.7°,for(012)].

X-raypolefiguremeasurementiscommonlyusedtostudythecrystallographicalignmentoforientedthinfilmsonsubstrates.Figures17-3(a)and(b)show(012)X-raypolefiguresoftheLiNbO3filmspreparedonsapphireCsubstratesfromSTD–LiNbO3and1equiv.PBDmodifiedLiNbO3precursorsolutions,respectively(Hirano,2002).Thepolefiguresareconstructedfor{012}planes.Thetermβistherotationaxisperpendiculartothefilmplane,andaistherotationaxisperpendiculartoβand𝜃.TheX-raypolefiguresof(012)planefortheLiNbO3singlecrystalsandsapphireCshowthreespotsatevery120°alongβ.However,thepolefigureshowninFigure17-3(a)exhibitsadditionalspotsthanthatofLiNbO3singlecrystalwhennon-modifiedSTD-LiNbO3precursorsolutionsareused.SixspotsshowninFigure17-3(a)arecomposedoftwogroupsofrotatedthreespots,onegroupwithastrongerintensityandtheothergroupwithaweakerintensity.Thisratiosuggeststhatthestructuresappearatnucleationandgrewthroughcrystallization.SinceLiNbO3singlecrystalshavetriangularoxygenplanesthatarerotatedby60°aroundthec-axis,themisorientationshouldbeformedeasilyat60°alongthec-axisduringnucleationandgrowth.ThesimilartwinstructureofLiTaO3filmsonsapphiresubstrateisreportedtoformbypulsedlaserdeposition(Agostinelli,1993).Ontheotherhand,thepolefigureoftheLiNbO3filmpreparedonsapphireCfromPBD-modifiedLiNbO3precursorsolution(Fig.17-3(b))isdifferentfromthatshowninFigure17-3(a).Thefigureshowstheconcentratedspotswithathree-foldsymmetry,

展开阅读全文
相关资源
猜你喜欢
相关搜索

当前位置:首页 > IT计算机 > 电脑基础知识

copyright@ 2008-2023 冰点文库 网站版权所有

经营许可证编号:鄂ICP备19020893号-2